Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 (MRS Proceedings)

Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 (MRS Proceedings)

  • List Price: $40.99
  • ISBN-10: 1558994734
  • ISBN-13: 9781558994737
  • Edition: 1st
  • Type: Hardcover
  • Publisher: Cambridge University Press

About The Book

Chemical-mechanical planarization (CMP) has emerged over the past few years as a key enabling technology in the relentless drive of the semiconductor... Read more

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